DocumentCode :
3170025
Title :
Monte Carlo study of electron and hole transport for high speed and low-power sub-0.1 μm GaAs circuits
Author :
Awano, Yuji ; Tagawa, Yukio ; Shima, Masashi
Author_Institution :
Fujitsu Labs. Ltd., Atsugi, Japan
fYear :
1995
fDate :
7-9 Aug 1995
Firstpage :
408
Lastpage :
414
Abstract :
In order to evaluate high-speed and low-power performance of complementary GaAs devices, electron and hole transport in an ultra-short channel have been studied theoretically. Monte Carlo simulations for sub-0.1 μm devices show that, under the electric field of 100 kV/cm, the peak electron velocity in GaAs reaches a value more than 4 times higher than that in silicon, indicating the significant advantages of GaAs devices for high-frequency applications. We developed a new model for Monte Carlo simulation of hole transport, which includes not only heavy and light holes, but also split-off band holes. To the best of our knowledge, this is the first time that the accurate scattering probabilities of holes of these three bands have been calculated
Keywords :
III-V semiconductors; Monte Carlo methods; carrier mobility; gallium arsenide; integrated circuit modelling; semiconductor device models; 0.1 micron; GaAs; GaAs circuits; Monte Carlo simulation; complementary GaAs devices; electron transport; high speed operation; high-frequency applications; hole transport; low-power operation; model; peak electron velocity; scattering probabilities; splitoff band holes; ultra-short channel; Charge carrier processes; Circuits; Electrons; Gallium arsenide; Lattices; Light scattering; Monte Carlo methods; Probability; Silicon; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Speed Semiconductor Devices and Circuits, 1995. Proceedings., IEEE/Cornell Conference on Advanced Concepts in
Conference_Location :
Ithaca, NY
ISSN :
1079-4700
Print_ISBN :
0-7803-3970-3
Type :
conf
DOI :
10.1109/CORNEL.1995.482534
Filename :
482534
Link To Document :
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