• DocumentCode
    3170349
  • Title

    Applying Line, Offset-Series, Offset-Shunt calibration for on-wafer CMOS device characterizations

  • Author

    Huang, Chien-Chang ; Chang-Chien, Min-Yu ; Hsu, Yu-Cheng ; Ku, Kai-Wei

  • Author_Institution
    Dept. of Commun. Eng., Yuan Ze Univ., Chungli, Taiwan
  • fYear
    2009
  • fDate
    7-10 Dec. 2009
  • Firstpage
    417
  • Lastpage
    420
  • Abstract
    This paper presents a new calibration method using line, offset-series, offset-shunt standards for microwave scattering parameter measurements with applications of CMOS on-wafer device characterizations. The modifications of the reference planes for the series and the shunt standards avoid the ill-conditioned problem for the self-calibration equations as the phase shift of the line standard approaching 180 degrees. The measurement results are shown for an NMOS FET in TSMC CMOS 0.18 ¿m technology from 2 GHz to 60 GHz with comparisons of TRL calibration method.
  • Keywords
    CMOS integrated circuits; MOSFET; S-parameters; calibration; NMOS FET; NMOS microwave scattering parameter measurements; frequency 2 GHz to 60 GHz; offset-series calibration; offset-shunt calibration; on-wafer CMOS device characterizations; size 0.18 mum; CMOS technology; Calibration; Equations; FETs; MOS devices; Measurement standards; Microwave devices; Microwave measurements; Microwave theory and techniques; Scattering parameters; Scattering parameters; calibration; de-embedding; on-wafer measurements; vector network analyzer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 2009. APMC 2009. Asia Pacific
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4244-2801-4
  • Electronic_ISBN
    978-1-4244-2802-1
  • Type

    conf

  • DOI
    10.1109/APMC.2009.5384512
  • Filename
    5384512