Title :
TFT-LCD manufacturing technology — current status and future prospect —
Author_Institution :
Sony Corp., Atsugi
Abstract :
Current status and future prospect in the thin-film-transistor liquid crystal display (TFT-LCD) manufacturing technology are reviewed. Amorphous Si (a-Si) and low temperature poly-Si (LTPS) TFT-LCDs are discussed in this paper. Each device structure and fabrication process is outlined. Future trends in TFT-LCD manufacturing technologies are described in terms of substrate size enlargement and In-cell integration technologies.
Keywords :
amorphous semiconductors; liquid crystal displays; thin film devices; TFT-LCD manufacturing technology; amorphous Si; low temperature poly-Si; thin-film-transistor liquid crystal display; Assembly; Electrodes; Glass; Inspection; Large scale integration; Liquid crystal displays; Manufacturing; Optical polarization; Substrates; Thin film transistors; IPS mode; LTPS-TFT; TFT-LCD; TN mode; VA mode; a-Si TFT; in-cell; system integration;
Conference_Titel :
Physics of Semiconductor Devices, 2007. IWPSD 2007. International Workshop on
Conference_Location :
Mumbai
Print_ISBN :
978-1-4244-1728-5
Electronic_ISBN :
978-1-4244-1728-5
DOI :
10.1109/IWPSD.2007.4472449
