A system to deposit boron films (boronization) in the DIII-D tokamak

Author

Hodapp, T.R. ; Jackson, G.L. ; Phillips, J. ; Holtrop, K.L. ; Petersen, P.I. ; Winter, J.

Author_Institution

General Atomics, San Diego, CA, USA

fYear

1991

fDate

30 Sep-3 Oct 1991

Firstpage

392

Abstract

A system has been added to the DIII-D tokamak to coat its plasma facing surfaces with a film of boron using diborane gas. The system includes special health and safety equipment for handling the diborane gas, which is toxic and inflammable. The purpose of the boron film is to reduce the levels of impurity atoms in the DIII-D plasmas. Experiments following the application of the boron film in DIII-D have led to significant reductions in plasma impurity levels and the observation of a new, very high confinement regime

Keywords

boron; fusion reactor materials; fusion reactor safety; fusion reactor theory and design; plasma impurities; plasma toroidal confinement; surface hardening; thin films; B film; DIII-D tokamak; boronization; diborane gas; handling; health; impurity atoms; inflammable; plasma facing surfaces; plasma impurity levels; safety equipment; toxic; very high confinement regime; Atomic measurements; Boron; Helium; Impurities; Plasma applications; Plasma chemistry; Plasma confinement; Plasma density; Plasma sources; Tokamaks;

fLanguage

English

Publisher

ieee

Conference_Titel

Fusion Engineering, 1991. Proceedings., 14th IEEE/NPSS Symposium on

Conference_Location

San Diego, CA

Print_ISBN

0-7803-0132-3

Type

conf

DOI

10.1109/FUSION.1991.218796

Filename

218796