DocumentCode :
3171521
Title :
Trimming analog circuits using floating-gate analog MOS memory
Author :
Carley, L.R.
Author_Institution :
Carnegie-Mellon Univ., Pittsburgh, PA, USA
fYear :
1989
fDate :
15-17 Feb. 1989
Firstpage :
202
Lastpage :
203
Abstract :
The author presents an analog trim-voltage memory (ATVM) which employs a floating-gate MOS structure similar to that used in digital electrically erasable and programmable read-only memories (EEPROMs). The ATVM is suitable for trimming the offset voltages and currents resulting from threshold mismatches in analog circuits such as operational amplifiers and comparators. It can be incorporated into a standard digital CMOS process without the additional processing steps typically needed for EEPROM fabrication. This floating-gate memory uses hot-electron injection to decrease the floating-gate voltage and electron tunneling from the floating gate to increase the voltage. A possible use of the ATVM circuit is shown along with the input stage of a two-stage Miller compensated op amp.<>
Keywords :
CMOS integrated circuits; analogue storage; integrated memory circuits; ATVM; an analog trim-voltage memory; analogue circuits trimming; application; electron tunneling; floating gate voltage adjustment; floating-gate MOS structure; floating-gate analog MOS memory; floating-gate memory; hot-electron injection; offset current trimming; offset voltage trimming; standard digital CMOS process; two-stage Miller compensated op amp; Analog circuits; CMOS process; EPROM; Fabrication; Nonvolatile memory; Operational amplifiers; PROM; Secondary generated hot electron injection; Threshold voltage; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference, 1989. Digest of Technical Papers. 36th ISSCC., 1989 IEEE International
Conference_Location :
New York, NY, USA
Type :
conf
DOI :
10.1109/ISSCC.1989.48260
Filename :
48260
Link To Document :
بازگشت