DocumentCode :
3171766
Title :
Effects of lateral scaling on power gain of multifinger SiGe power HBTs
Author :
Jiang, Ningyue ; Ma, Pingxi ; Reddy, Vijay ; Racanelli, Marco ; Ma, Zhenqiang
Author_Institution :
Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI
fYear :
2006
fDate :
18-20 Jan. 2006
Abstract :
The lateral scaling issues of high-power SiGe HBTs are analytically studied and verified using industry SiGe HBTs. It is found that due to increased parasitics in large-area power SiGe HBTs, fmax cannot be readily improved by only downscaling the emitter finger width. It is further found that without proper downscaling of the base stripe width, the maximum stable power gain (MSG) of power SiGe HBTs may be degraded by only shrinking the emitter finger width. It is thus proposed that both emitter finger width and the base stripe width ought to be downscaled properly in order to optimize the RF performance of SiGe power HBTs that are configured in a multiple subcell structure
Keywords :
Ge-Si alloys; heterojunction bipolar transistors; power bipolar transistors; SiGe; base stripe width; emitter finger width; heterojunction bipolar transistor; lateral scaling; maximum stable power gain; multifinger power HBT; Computer industry; Degradation; Drives; Fingers; Germanium silicon alloys; Heterojunction bipolar transistors; Power engineering and energy; Radio frequency; Silicon germanium; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Silicon Monolithic Integrated Circuits in RF Systems, 2006. Digest of Papers. 2006 Topical Meeting on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-9472-0
Type :
conf
DOI :
10.1109/SMIC.2005.1587913
Filename :
1587913
Link To Document :
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