DocumentCode :
3171823
Title :
Design and fabrication of a novel two-dimension MEMS-based tunable capacitor
Author :
Wang, Cong-Shun ; Yang, Zheh-Chuan ; Cui, Yun-Jun ; Fang, Jing ; Zhang, Da-Cheng
Author_Institution :
Dept. of Mech. & Eng. Sci., Peking Univ., Beijing, China
Volume :
2
fYear :
2002
fDate :
29 June-1 July 2002
Firstpage :
1766
Abstract :
In this paper, a novel bulk micromachined two-dimension tunable capacitor is proposed with the techniques of silicon-glass wafer bonding and deep reactive ion etch. The micromechanical tunable capacitor comprises a suspended plate array, a bottom electrode array corresponding with it that is fixed on the glass substrate, and side-interdigitated comb structures. When the suspended plate array is laterally driven by the electrostatic comb actuator, the capacitance (the first dimension) between the suspended plate array and bottom array, together with the interdigitated comb capacitance (the second dimension) tune linearly with applied voltage. Thus it increases tuning ratio and unbiased base capacitance. The finite element method simulation with ANSYS 5.5 is used to analyze the varying behavior of the capacitor. Meanwhile, the fabrication process is very simple in that only three masks are used, and very efficient to achieve high-Q values, because it employs glass instead of silicon as substrate.
Keywords :
Q-factor; capacitors; electrodes; electrostatic actuators; finite element analysis; micromachining; plasma materials processing; sputter etching; tuning; wafer bonding; 2D MEMS-based tunable capacitor; ANSYS 5.5 finite element method simulation; Q values; Si; bottom electrode array; bulk micromachined tunable capacitor; deep reactive ion etch; design; electrostatic comb actuator; fabrication process; glass substrate; interdigitated comb capacitance; laterally driven suspended plate array; masks; micromechanical tunable capacitor; side-interdigitated comb structures; silicon-glass wafer bonding; tuning ratio; unbiased base capacitance; Capacitance; Capacitors; Electrodes; Electrostatic actuators; Etching; Fabrication; Glass; Hydraulic actuators; Micromechanical devices; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Communications, Circuits and Systems and West Sino Expositions, IEEE 2002 International Conference on
Print_ISBN :
0-7803-7547-5
Type :
conf
DOI :
10.1109/ICCCAS.2002.1179120
Filename :
1179120
Link To Document :
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