DocumentCode :
3172039
Title :
Theoretical study of effect of position of dopant in a channel for nano scale devices
Author :
Lamba, V.K. ; Engles, Derick ; Malik, S.S.
Author_Institution :
Haryana Coll. of Technol., Haryana
fYear :
2007
fDate :
16-20 Dec. 2007
Firstpage :
247
Lastpage :
249
Abstract :
As the number of parameters such as carrier confinement, effects of parallel and transverse field- dependent mobility, carrier scattering due to Coulomb effects, acoustic phonons, impurity doping profile and surface roughness influences the transport process in the channel region. The simplest model of quantum transport in nano-devices is to describe the problem in terms of the scattering of the electron wave-function by a spatially varying potential. Here, we assume that this potential is situated between two electron reservoirs, each of which emits particles with an equilibrium distribution into the scattering region which is doped by impurity. As the reservoirs will, in general, have different chemical potentials, their difference representing an applied bias voltage. The net flux of electrons passing between the reservoirs constitutes the electrical current conducted by the device.
Keywords :
carrier mobility; chemical potential; impurity scattering; nanoelectronics; semiconductor doping; wave functions; channel mobility; chemical potentials; electron reservoirs; electron wave-function; impurity doping; nanoscale devices; quantum transport; spatially varying potential; Acoustic devices; Acoustic scattering; Carrier confinement; Doping profiles; Electrons; Impurities; Particle scattering; Phonons; Reservoirs; Scattering parameters; Carrier Scattering; Doping Profile; Mobility;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physics of Semiconductor Devices, 2007. IWPSD 2007. International Workshop on
Conference_Location :
Mumbai
Print_ISBN :
978-1-4244-1728-5
Electronic_ISBN :
978-1-4244-1728-5
Type :
conf
DOI :
10.1109/IWPSD.2007.4472492
Filename :
4472492
Link To Document :
بازگشت