Title :
High-performance SiGe power HBTs with wide emitter stripes
Author :
Wang, Guogong ; Yuan, Hao-Chih ; Ma, Zhenqiang
Author_Institution :
Dept. of Electr. & Comput. Eng., Wisconsin-Madison Univ., Madison, WI
Abstract :
Common-emitter and common-base SiGe power heterojunction bipolar transistors (PHBTs) with 2mum and 3mum emitter stripe widths have been fabricated and compared. The reduced base pinch resistance resulting from using a heavily doped base region has enabled excellent and equivalent RF performance from SiGe PHBTs of different emitter stripe widths. However, the total device area is saved by using wider emitter stripes. The current device design approach can help reduce the fabrication cost of SiGe PHBTs and make them more competitive than other existing technologies for microwave and RF power applications
Keywords :
Ge-Si alloys; heterojunction bipolar transistors; power bipolar transistors; 2 micron; 3 micron; SiGe; base pinch resistance; emitter stripes; power heterojunction bipolar transistors; Costs; Doping profiles; Fabrication; Gallium arsenide; Germanium silicon alloys; Heterojunction bipolar transistors; Millimeter wave technology; Proximity effect; Radio frequency; Silicon germanium;
Conference_Titel :
Silicon Monolithic Integrated Circuits in RF Systems, 2006. Digest of Papers. 2006 Topical Meeting on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-9472-0
DOI :
10.1109/SMIC.2005.1587981