Nanoimprint technology and its applications

Summary form only given. Nanoimprint lithography (NIL) is an emerging technology for high-throughput nanoscale patterning. Nanoimprinting uses a hard mold to mechanically deform a polymer material to create nanoscale structures, which provides unprecedented resolution and speed in nanopatterning. This talk will give an overview of the material requirement for the successful pattern replication in NIL. Due to its compatibility with polymer materials, Nanoimprint and its variants naturally find unique applications in polymer-based devices, including organic electronics and photonics. To gain even higher speed patterning over large areas, a recently developed Roll-to-Roll Nanoimprint Lithography on flexible web will also be discussed.