DocumentCode :
3173748
Title :
Luminescent behavior of MEH-PPV/porous silicon heterostructure
Author :
Banerji, P. ; Mishra, J.K.
fYear :
2007
fDate :
16-20 Dec. 2007
Firstpage :
565
Lastpage :
566
Abstract :
Hybrid devices formed by filling porous silicon with MEH-PPV or poly [2-methoxy-5(2-ethylhexyloxy-p- phenylenevinylene)] have been investigated in this work. Analyses of the structures by scanning electron microscopy (SEM) demonstrated that the porous silicon layer was filled by polymer with no significant change of the structures except that the polymer was infiltrated in some of the pores there by hanging the dielectric constant of the composite. The photoluminescence of the structures at 300 K showed that the emission intensity was very high as compared to that of MEH-PPV only and also blue-shift was observed. The observations were explained on the basis of the exciton transfer from porous silicon to MEH-PPV.
Keywords :
elemental semiconductors; excitons; filled polymers; organic semiconductors; permittivity; photoluminescence; porous semiconductors; scanning electron microscopy; semiconductor junctions; silicon; spectral line shift; MEH-PPV-porous silicon heterostructure; SEM; Si; blue-shift; dielectric constant; emission intensity; exciton transfer; luminescent behavior; photoluminescence; poly [2-methoxy-5(2-ethylhexyloxy-p-phenylenevinylene)]; scanning electron microscopy; temperature 300 K; Coatings; Dielectric constant; Filling; Indium tin oxide; Luminescence; Photoluminescence; Polymer films; Scanning electron microscopy; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physics of Semiconductor Devices, 2007. IWPSD 2007. International Workshop on
Conference_Location :
Mumbai
Print_ISBN :
978-1-4244-1728-5
Electronic_ISBN :
978-1-4244-1728-5
Type :
conf
DOI :
10.1109/IWPSD.2007.4472578
Filename :
4472578
Link To Document :
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