DocumentCode :
3174033
Title :
Reliability study in capacitor less 1T-RAM cells on SOI
Author :
Aoulaiche, M. ; Collaert, N. ; Simoen, E. ; Mercha, A. ; De Wachter, B. ; Bourdelle, K.K. ; Nguyen, B.Y. ; Boedt, F. ; Delprat, D. ; Jurczak, M. ; Altimime, L.
Author_Institution :
IMEC, Heverlee, Belgium
fYear :
2010
fDate :
11-14 Oct. 2010
Firstpage :
1
Lastpage :
2
Abstract :
We have shown that careful optimization of the write conditions is needed in order to achieve the stringent endurance spec of 1016 cycles for 1T-RAM cells without compromising the sense margin and retention. The degradation seen during cycling of the cells can be attributed to the creation of interface states and carrier trapping at either the source (“0”) or drain side (“1”). Overall reduction of the biases, especially VD, will have a beneficial effect on the endurance behavior.
Keywords :
MOSFET; interface states; random-access storage; semiconductor device reliability; silicon-on-insulator; SOI; capacitor less RAM cells; carrier trapping; interface states; reliability study; Charge carrier processes; Degradation; Logic gates; Random access memory; Reliability; Stress; Transient analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference (SOI), 2010 IEEE International
Conference_Location :
San Diego, CA
ISSN :
1078-621x
Print_ISBN :
978-1-4244-9130-8
Electronic_ISBN :
1078-621x
Type :
conf
DOI :
10.1109/SOI.2010.5641377
Filename :
5641377
Link To Document :
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