DocumentCode :
3174191
Title :
Fin shape influence on the analog performance of standard and strained MuGFETs
Author :
Bühler, R.T. ; Martino, J.A. ; Agopian, P.G.D. ; Giacomini, R. ; Simoen, E. ; Claeys, C.
Author_Institution :
LSI/PSI, Univ. of Sao Paulo, Sao Paulo, Brazil
fYear :
2010
fDate :
11-14 Oct. 2010
Firstpage :
1
Lastpage :
2
Abstract :
From the analog performance perspective, there is a fin cross-section shape influence on electric parameters. At weak inversion levels the gm/ID is shape dependent, while for moderate and strong inversions the strain type is dominant, where the mobility starts to play an important role. The output conductance and the Early voltage show a strong dependence on both fin shape and strain type. For thinner Wmid there is a performance increase of up to 3 dB on intrinsic voltage gain compared to rectangular shape. Strained devices present better AV and fT, both following the gm tendency for each channel length.
Keywords :
field effect transistors; analog performance; channel length; electric parameters; fin cross-section shape influence; fin shape influence; intrinsic voltage gain; output conductance; rectangular shape; standard MuGFET; strain type; strained MuGFET; strained devices; weak inversion levels; Gain; Logic gates; Numerical models; Shape; Silicon; Strain; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference (SOI), 2010 IEEE International
Conference_Location :
San Diego, CA
ISSN :
1078-621x
Print_ISBN :
978-1-4244-9130-8
Electronic_ISBN :
1078-621x
Type :
conf
DOI :
10.1109/SOI.2010.5641387
Filename :
5641387
Link To Document :
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