Fabrication of 3-D PDMS nano-template for UV nano-imprint lithography and micro contact printing by means of grey scale electron beam lithography

Author

Rudzinski, Axel ; Barth, Ulrich ; Kahl, Michael ; Huhn, B.-A. ; Kopetz, Stefan ; Rabe, Erik ; Neyer, Andreas

Author_Institution

Raith GmbH, Dortmund

fYear

2007

fDate

16-20 Dec. 2007

Firstpage

840

Lastpage

842

Abstract

The fabrication process of PDMS embossing tools for nano scale pattern transfer like it is used for step and flash imprint lithography and micro contact printing has been investigated. We added an electroplating process to achieve a mother mask for the PDMS tool that withstands a lifetime use without any kind of abrasion. The work will focus on the pattern preparation and the process step of 3-dimensional e-beam lithography. Furthermore the realization into nickel and subsequently molding into PDMS will be described.

Keywords

electron beam lithography; electroplating; embossing; nanolithography; polymers; soft lithography; 3D PDMS nanotemplate; UV nanoimprint lithography; electroplating process; embossing tools; fabrication process; flash imprint lithography; grey scale electron beam lithography; micro contact printing; mother mask; nano scale pattern transfer; pattern preparation; Costs; Electron beams; Fabrication; Lead; Lithography; Manufacturing processes; Nickel; Printing; Proximity effect; Resists; Electron beam lithography; PDMS; nano-imprint; nanoelectroplating; three-dimensional lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Physics of Semiconductor Devices, 2007. IWPSD 2007. International Workshop on

Conference_Location

Mumbai

Print_ISBN

978-1-4244-1727-8

Electronic_ISBN

978-1-4244-1728-5

Type

conf

DOI

10.1109/IWPSD.2007.4472651

Filename

4472651