Title :
Fabrication and characterization of IC-processed brightness enhancement films
Author :
Lin, Liwei ; Skia, T.K. ; Chiu, Chun-Jung
Author_Institution :
Dept. of Mech. Eng. & Appl. Mech., Michigan Univ., Ann Arbor, MI, USA
Abstract :
IC-processed brightness enhancement films have been successfully fabricated and characterized. A process which combines anisotropic silicon etching and plastic molding has been used to fabricate high quality, large area (four inches in diameter) transparent films. These films have thickness of about 150 μm with fine micro pyramids (30 μm base width and 20 μm in height) on top. By placing these films on top of a backlight, optical tests show that up to 20% brightness enhancement in the front viewing angle of about ±35° can be achieved. Potential applications are devices with LCD displays in laptop computers, personal TVs and camcorders
Keywords :
brightness; etching; integrated circuit technology; liquid crystal displays; micromachining; optical films; optical polymers; polymer films; silicon; 150 mum; 20 mum; 30 mum; 4 in; IC-processed brightness enhancement films; LCD displays; PMMA; Si; Si micromachining process; anisotropic silicon etching; backlight; camcorders; fabrication; fine micro pyramids; front viewing angle; high quality large area transparent films; laptop computers; personal TV; plastic molding; Anisotropic magnetoresistance; Brightness; Computer displays; Etching; Fabrication; Optical films; Plastic films; Semiconductor films; Silicon; Testing;
Conference_Titel :
Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
0-7803-3829-4
DOI :
10.1109/SENSOR.1997.635732
