Fabrication and characterization of IC-processed brightness enhancement films

Author

Lin, Liwei ; Skia, T.K. ; Chiu, Chun-Jung

Author_Institution

Dept. of Mech. Eng. & Appl. Mech., Michigan Univ., Ann Arbor, MI, USA

Volume

2

fYear

1997

fDate

16-19 Jun 1997

Firstpage

1427

Abstract

IC-processed brightness enhancement films have been successfully fabricated and characterized. A process which combines anisotropic silicon etching and plastic molding has been used to fabricate high quality, large area (four inches in diameter) transparent films. These films have thickness of about 150 μm with fine micro pyramids (30 μm base width and 20 μm in height) on top. By placing these films on top of a backlight, optical tests show that up to 20% brightness enhancement in the front viewing angle of about ±35° can be achieved. Potential applications are devices with LCD displays in laptop computers, personal TVs and camcorders

Keywords

brightness; etching; integrated circuit technology; liquid crystal displays; micromachining; optical films; optical polymers; polymer films; silicon; 150 mum; 20 mum; 30 mum; 4 in; IC-processed brightness enhancement films; LCD displays; PMMA; Si; Si micromachining process; anisotropic silicon etching; backlight; camcorders; fabrication; fine micro pyramids; front viewing angle; high quality large area transparent films; laptop computers; personal TV; plastic molding; Anisotropic magnetoresistance; Brightness; Computer displays; Etching; Fabrication; Optical films; Plastic films; Semiconductor films; Silicon; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on

Conference_Location

Chicago, IL

Print_ISBN

0-7803-3829-4

Type

conf

DOI

10.1109/SENSOR.1997.635732

Filename

635732