• DocumentCode
    3176512
  • Title

    Self-aligned chip-to-chip optical interconnections in ultra-thin 3D glass interposers

  • Author

    Vis, William ; Chou, Bruce C. ; Sundaram, Venky ; Tummala, Rao

  • Author_Institution
    3D Syst. Packaging Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2015
  • fDate
    26-29 May 2015
  • Firstpage
    804
  • Lastpage
    809
  • Abstract
    This paper presents the modeling, design and demonstration of a three-dimensional polymer waveguide (3D WG) that couples two optical through-package vias (TPVs) in a 3D ultra-thin glass interposer for chip-to-chip optical communications. Coupling of the device is enabled using positive and negative sloped, 45° total internal reflection (TIR) micro-mirrors. The simulated coupling efficiency is within 0.5 dB for 45±5°. A novel inclined UV photolithography process is proposed to fabricate the microstructures simultaneously with self-alignment. The alignment is inherent because it is resolved prior to inclined photolithography during the planar patterning of double-sided metallization layers. The new process is experimentally demonstrated using commercially available PCB manufacturing technologies. The measured alignment tolerance between the optical via and the polymer waveguide is within 2.5 um across the entire panel. Fifty micron tall polymer WGs at 20 ~ 60 um width with 45 degree entry and exit turning surfaces are fabricated on 150um thick glass substrate. Rounded waveguide sidewalls and inadequate adhesion are observed, which requires further process development to allow high quality optical measurements.
  • Keywords
    integrated circuit metallisation; integrated optoelectronics; optical interconnections; ultraviolet lithography; 3D polymer waveguide; 3D ultrathin glass interposer; PCB manufacturing technology; TIR micromirrors; UV photolithography process; chip-to-chip optical communications; chip-to-chip optical interconnections; double-sided metallization layer; optical through-package vias; planar patterning; self-alignment; size 150 mum; total internal reflection; ultrathin 3D glass interposers; Glass; Lithography; Optical waveguides; Polymers; Substrates; Three-dimensional displays; Turning; 3D glass interposer; 3D polymer waveguide; inclined lithography; micromirror;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
  • Conference_Location
    San Diego, CA
  • Type

    conf

  • DOI
    10.1109/ECTC.2015.7159684
  • Filename
    7159684