Title :
High voltage LDMOSFET modeling using BSIM6 as intrinsic-MOS model
Author :
Sahoo, Jyoti Ranjan ; Agarwal, Harshit ; Yadav, Chandresh ; Kushwaha, Pragya ; Khandelwal, Sourabh ; Gillon, Renaud ; Chauhan, Yogesh Singh
Author_Institution :
Indian Inst. of Technol., Kanpur, Kanpur, India
Abstract :
Here, we report high voltage MOSFET modeling using BSIM6 model. The model has two components - intrinsic MOSFET channel of LDMOS modeled by BSIM6 and a drift region modeled by non-linear drift resistance. BSIM6 is the next generation bulk MOSFET model in BSIM family of models. It also have the model of Self Heating Effect (SHE) which is very important for high power devices like LDMOS. This model shows good behaviour over wide range of gate and drain bias conditions including convergence. Some of the effects like Quasi-saturation, self-heating and impact ionization are modelled by the combination of BSIM6 and drift-resistance models. We have validated this model on the simulated characteristics generated by TCAD and then, on the measured characteristics of a LDMOS device, where it shows excellent accuracy over entire bias range.
Keywords :
MOSFET; convergence; semiconductor device models; BSIM6 model; SHE; TCAD; convergence; drain bias conditions; drift region; gate bias conditions; high power devices; high voltage LDMOSFET modeling; intrinsic-MOS model; lateral double-diffused MOS; next generation bulk model; nonlinear drift resistance; quasi-saturation; self heating effect; Data models; Immune system; Logic gates; MOSFET; Resistance; Semiconductor device modeling; Semiconductor process modeling; BSIM6; Drift Resistance; Lateral Double-Diffused MOS (LDMOS); Self heating Effect;
Conference_Titel :
Microelectronics and Electronics (PrimeAsia), 2013 IEEE Asia Pacific Conference on Postgraduate Research in
Conference_Location :
Visakhapatnam
Print_ISBN :
978-1-4799-2750-0
DOI :
10.1109/PrimeAsia.2013.6731178