Title :
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
Abstract :
Presents the front matter and table of contents for the conference proceedings.
Keywords :
CMOS integrated circuits; integrated circuit technology; large scale integration; semiconductor junctions; CMOS LSI; junction technology; metal/metal junction; metal/silicon junction; silicide/silicon junction; ultra-shallow source/drain junction;
Conference_Titel :
Junction Technology, 2000, The first international workshop on, Extended abstracts of
Conference_Location :
Makuhari, Japan
Print_ISBN :
4-89114-008-9
DOI :
10.1109/IWIT.2000.928767
