Title :
Multiphysics-modeling of corrosion in copper-aluminum interconnects in high humidity environments
Author :
Lall, Pradeep ; Yihua Luo ; Luu Nguyen
Author_Institution :
Dept. of Mech. Eng., Auburn Univ., Auburn, AL, USA
Abstract :
Copper aluminum interconnects are being used in automotive applications for deployment underhood, on-engine and on-transmission. Electronics is widely used for enabling safety function including lane departure warning systems, collision avoidance systems, antilock braking systems, and vehicle stability systems. Models for copper interconnect degradation are needed for life prediction modeling to ensure 10-year, 100,000 mile reliability for electronics in automotive applications. Small concentrations of chloride ions may diffuse towards the bond pad interface under temperature, humidity, and electrical bias. The chloride ions may act as a catalyst breaking down the passivation layer of aluminum pad and accelerate the micro-galvanic corrosion at the copper-aluminum leading to the failure of the wirebond. Models for prediction of the diffusion of the chloride ions and the corrosion of the copper-aluminum interface have been difficult to develop, because of the small scale of the interface and the lack of appropriate electro-chemical properties for the Cu-Al system and the Electronic Molding Compounds under conditions relevant to operation. In this effort, a multiphysics model for electrolytic corrosion in the presence of chloride has been presented. The contaminant diffusion along with the corrosion kinetics has been modeled. In addition, contaminated samples with known concentration of KCl contaminant have been subjected to the temperature humidity conditions of 130°C/100RH. The resistance of the Cu-Al interconnects in the PARR test have been monitored periodically using resistance spectroscopy. The diffusion coefficients of chloride ion has been measured in the electronic molding compound at various temperatures using two methods including diffusion cell and inductively coupled plasma (ICPMS). Moisture ingress into the EMC has been quantified through measurements of the weight gain in the EMC as a function of time. Tafel parameters including the open circuit- potential and the slope of the polarization curve has been measured for both copper, aluminum under different concentrations of the ionic species and pH values in the EMC. The measurements have been incorporated into the COMSOL model to predict the corrosion current at the Cu-Al bond pad. The model predictions have been correlated with experimental data.
Keywords :
aluminium; automotive electronics; braking; collision avoidance; copper; humidity; interconnections; lead bonding; moulding; passivation; plasma applications; polarisation; road safety; spectroscopy; COMSOL model; Cu-Al; ICPMS; PARR test; Tafel parameters; aluminum pad; antilock braking systems; automotive applications; bond pad interface; chloride ions; collision avoidance systems; contaminant diffusion; copper interconnect degradation; copper-aluminum interconnects; copper-aluminum interface; corrosion current; diffusion cell; diffusion coefficients; electrical bias; electrochemical properties; electrolytic corrosion; electronic molding compounds; inductively coupled plasma; lane departure warning systems; life prediction modeling; microgalvanic corrosion; moisture ingress; multiphysics-modeling; open circuit potential; pH values; passivation layer; polarization curve; resistance spectroscopy; temperature humidity conditions; underhood; vehicle stability systems; wirebond; Compounds; Corrosion; Electromagnetic compatibility; Ions; Plasma measurements; Plasma temperature; Temperature measurement;
Conference_Titel :
Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
Conference_Location :
San Diego, CA
DOI :
10.1109/ECTC.2015.7159724