Title :
Wafer topography measurement by fast optical scanning deflectometry
Author :
Krey, S. ; Peter, F. ; Dumitrescu, E. ; van Amstel, W.D. ; Klaver, R.G. ; Lous, E.J.
Author_Institution :
TRIOPTICS GmbH, Wedel, Germany
Abstract :
Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 μrad is presented.
Keywords :
laser mirrors; lenses; measurement by laser beam; optical instruments; optical variables measurement; ray tracing; surface topography measurement; 12 inch; fast optical scanning deflectometry; laser beam deflection; lens; optical surfaces; oscillating mirror; physical ray tracing; surface figure measurement; telecentric scanning; wafer topography measurement; Laser beams; Laser theory; Lenses; Mirrors; Optical sensors; Position measurement; Ray tracing; Semiconductor lasers; Spatial resolution; Surface topography;
Conference_Titel :
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN :
0-7803-7734-6
DOI :
10.1109/CLEOE.2003.1313528
