Title :
Fabrication and Characterization of nanowires by Atomic Force Microscope Lithography
Author :
Fok, L.M. ; Liu, Y.H. ; Li, Wen J.
Author_Institution :
Network Sensors & Robotics Lab., Chinese Univ. of Hong Kong
Abstract :
A system, employing the probe of an atomic force microscope to mechanically pattern various materials such as photoresist, semiconductors or polymers in the nanometer regime has been developed. The system was utilized for characterization of nanowires including carbon nanotubes (CNTs) and silicon nanowires (SiNWs)
Keywords :
atomic force microscopy; carbon nanotubes; nanolithography; nanowires; atomic force microscope lithography; carbon nanotubes; nanowire fabrication; silicon nanowires; Atomic force microscopy; Carbon nanotubes; Fabrication; Lithography; Nanowires; Polymers; Probes; Resists; Semiconductor materials; Silicon; Atomic Force Microscope; lithography; nanowires;
Conference_Titel :
Intelligent Robots and Systems, 2006 IEEE/RSJ International Conference on
Conference_Location :
Beijing
Print_ISBN :
1-4244-0258-1
Electronic_ISBN :
1-4244-0259-X
DOI :
10.1109/IROS.2006.282320
