Title :
Simultaneous measurement of electron beam size and divergence with an undulator
Author :
Yang, B.X. ; Lumpkin, A.H.
Author_Institution :
Adv. Photon Source, Argonne Nat. Lab., IL, USA
Abstract :
We present the simultaneous measurement of beam divergence and source size based on the APS diagnostic undulator line. A 300-μm-thick Si(400) crystal monochromator is used to measure the divergence with a resolution down to 3 μrad (1 μrad with the third harmonic). X-rays transmitted through the crystal are simultaneously used by a pinhole camera to measure the beam size, at a resolution of about 40 μm. We demonstrate that this measurement of emittance is robust against fluctuations of lattice functions due to a partial cancellation of systematic errors present in each of the measurements
Keywords :
X-ray monochromators; electron beams; particle beam diagnostics; wigglers; 300 micron; 300 mum; 40 micron; APS; Si; Si(400) crystal monochromator; X-rays; diagnostic undulator line; electron beam size; electron divergence; lattice functions; resolution; simultaneous measurement; source size; systematic errors; undulator; Cameras; Electron beams; Lattices; Particle beam measurements; Particle beams; Photonic crystals; Size measurement; Time measurement; Undulators; X-rays;
Conference_Titel :
Particle Accelerator Conference, 1999. Proceedings of the 1999
Conference_Location :
New York, NY
Print_ISBN :
0-7803-5573-3
DOI :
10.1109/PAC.1999.794406
