Simultaneous measurement of electron beam size and divergence with an undulator

Author

Yang, B.X. ; Lumpkin, A.H.

Author_Institution

Adv. Photon Source, Argonne Nat. Lab., IL, USA

Volume

3

fYear

1999

fDate

1999

Firstpage

2161

Abstract

We present the simultaneous measurement of beam divergence and source size based on the APS diagnostic undulator line. A 300-μm-thick Si(400) crystal monochromator is used to measure the divergence with a resolution down to 3 μrad (1 μrad with the third harmonic). X-rays transmitted through the crystal are simultaneously used by a pinhole camera to measure the beam size, at a resolution of about 40 μm. We demonstrate that this measurement of emittance is robust against fluctuations of lattice functions due to a partial cancellation of systematic errors present in each of the measurements

Keywords

X-ray monochromators; electron beams; particle beam diagnostics; wigglers; 300 micron; 300 mum; 40 micron; APS; Si; Si(400) crystal monochromator; X-rays; diagnostic undulator line; electron beam size; electron divergence; lattice functions; resolution; simultaneous measurement; source size; systematic errors; undulator; Cameras; Electron beams; Lattices; Particle beam measurements; Particle beams; Photonic crystals; Size measurement; Time measurement; Undulators; X-rays;

fLanguage

English

Publisher

ieee

Conference_Titel

Particle Accelerator Conference, 1999. Proceedings of the 1999

Conference_Location

New York, NY

Print_ISBN

0-7803-5573-3

Type

conf

DOI

10.1109/PAC.1999.794406

Filename

794406