DocumentCode :
3180566
Title :
GaInAsN based lasers for the 1.3 and 1.5 μm wavelength range
Author :
Fischer, M. ; Gollub, D. ; Reinhardt, M. ; Forchel, A.
Author_Institution :
Tech. Phys., Wurzburg Univ., Germany
fYear :
2001
fDate :
2001
Firstpage :
101
Lastpage :
104
Abstract :
Since the introduction of the GaAs based material system GaInAsN for long wavelength laser diodes several years ago, rapid progress has been made in improving the performance of these devices. We present some of our efforts and results in the optimized growth of GaInAsN/GaAs quantum well structures in the 1.3-1.55 μm wavelength region by solid source MBE using an RF plasma source for the generation of active nitrogen. Based on this preliminary work, we have fabricated GaInAsN LDs with emission wavelengths up to >1.5 μm. Laser performance data for 1.3 and 1.5 μm devices are presented and compared
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; molecular beam epitaxial growth; photoluminescence; quantum well lasers; semiconductor quantum wells; waveguide lasers; 1.3 to 1.55 mum; GaInAsN LDs; GaInAsN based lasers; GaInAsN/GaAs quantum well structures; GaInNAs-GaAs; RF plasma source; SCH laser structure; active nitrogen generation; emission wavelength; laser performance data; long wavelength laser diodes; optimized growth; photoluminescence spectra; ridge waveguide LDs; solid source MBE; Diode lasers; Gallium arsenide; Molecular beam epitaxial growth; Nitrogen; Optical materials; Plasma temperature; Radio frequency; Surface emitting lasers; Vertical cavity surface emitting lasers; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
Conference_Location :
Nara
ISSN :
1092-8669
Print_ISBN :
0-7803-6700-6
Type :
conf
DOI :
10.1109/ICIPRM.2001.929028
Filename :
929028
Link To Document :
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