DocumentCode :
3181148
Title :
Design and simulation of a High-Q, Low Motional Resistance, Highly Linear IF Microelectromechanical Filter
Author :
Babazadeh, F. ; Keshmiri, S.H.
Author_Institution :
Ferdowsi Univ., Mashhad
fYear :
2007
fDate :
23-26 May 2007
Firstpage :
45
Lastpage :
53
Abstract :
In this paper, design and simulation of an IC-compatible microelectromechanical bandpass filter for use in intermediate frequency range of a wireless communication system is reported. This filter is composed of two high-Q microresonators coupled by a soft flexural-mode mechanical spring and can be implemented using either polysilicon surface micromachining technology or bulk micromachining of SOI wafers. The resonators with new design and structure determine the center frequency, while a mechanical coupling spring defines the bandwidth of the filter. Quarter-wavelength coupling is required on this microscale to alleviate mass-loading effects caused by similar resonator and coupler dimensions. Filter center frequencies around 71 MHz, 285 kHz bandwidth, quality factor of 250, associated insertion loss less than 0.44 dB, spurious-free dynamic ranges around 92 dB and input and output termination resistances on the order of 9 kOmega were obtained by this design.
Keywords :
Q-factor; VHF filters; band-pass filters; micromachining; micromechanical resonators; silicon-on-insulator; springs (mechanical); IC-compatible bandpass filter; SOI wafers; bandwidth 285 kHz; bulk micromachining; frequency 71 MHz; high-Q microresonators; insertion loss; intermediate frequency filter; linear IF microelectromechanical filter; low motional resistance; mass-loading effects; polysilicon surface micromachining technology; quality factor; quarter-wavelength coupling; resistance 9 kohm; soft flexural-mode mechanical spring; wireless communication system; Band pass filters; Bandwidth; Frequency; Microcavities; Micromachining; Nonlinear filters; Q factor; Resonator filters; Springs; Wireless communication; Bandpass Filter; Intermediate Frequency; MEMS; Micromechanical Resonator; Motional Resistance; Quality Factor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Perspective Technologies and Methods in MEMS Design, 2007. MEMSTECH 2007. International Conference on
Conference_Location :
Lviv-Polyana
Print_ISBN :
978-966-553-614-7
Type :
conf
DOI :
10.1109/MEMSTECH.2007.4283422
Filename :
4283422
Link To Document :
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