Title :
Laser fabrication of micro sized diffractive and refractive optical devices in fused silica and glass
Author :
Bohme, Rico ; Zimmer, Klaiu
Author_Institution :
Leibniz-Inst. for Suface Modification e.V., Leipzig, Germany
Abstract :
Laser ablation has proved to be a flexible method for direct micro-structuring of micro-mechanical, micro-fluid or micro-optical components. In this work we will present recent results on micro-machining of fused silica and different glasses. An excimer laser running at λ=248 nm (KrF) or λ=351 nm (XeF) (τp=20 ns) was used for the experiments. Various solutions of acetone, toluene and tetrachloroethylene containing pyrene in different concentrations (0.1-0.5 M [mol/1]) have been applied for studying the etching process. The influence of the laser and process parameters (e.g. laser fluency, scan velocity, etc.) on the etch rate and the surface roughness of the materials are investigated quantitatively with the aim of process optimization. Using these parameters the fabrication of three-dimensional micro-topographies in fused silica, pyrex and other glass by direct laser writing with the scanning contour mask technique will be shown. The etched cylindrical structures and micro-prisms show sharp edges and smooth surfaces with micro-roughness below 10 nm RMS at a etch depth of more than 30 μm. Also the machining of linear or crossed phase gratings with a period less than 20 μm is mentioned.
Keywords :
diffraction gratings; etching; excimer lasers; krypton compounds; laser ablation; laser beam machining; micro-optics; micromachining; optical fabrication; optical glass; optical prisms; organic compounds; photolithography; silicon compounds; surface roughness; xenon compounds; 20 ns; 248 nm; 351 nm; KrF; SiO2; XeF; acetone; crossed phase grating; direct laser writing; direct micro-structuring; etching process; excimer laser; fused silica; glass; laser ablation; laser fabrication; laser fluency; linear phase grating; micro sized diffractive optical device; micro-machining; micro-prisms; micro-roughness; pyrene; pyrex; refractive optical device; scan velocity; surface roughness; tetrachloroethylene; toluene; Etching; Glass; Laser ablation; Microoptics; Optical device fabrication; Optical devices; Optical diffraction; Optical refraction; Rough surfaces; Silicon compounds;
Conference_Titel :
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN :
0-7803-7734-6
DOI :
10.1109/CLEOE.2003.1313753