Title :
Improved resist treatment for gray tone lithographic beam shaping element fabrication
Author :
Hartung, H. ; Cumme, M. ; Thieme, M. ; Kley, E.-B. ; Tunnerman, A.
Author_Institution :
Inst. of Appl. Phys., Friedrich-Schiller-Univ., Jena, Germany
Abstract :
We designed a refractive beam shaping element, which forms a line shaped beam out of a Gaussian output beam of a laser diode. Using a geometric optical method based on the thin element approximation (TEA), a refractive element with a height of 45 μm and a foot print of about 1200×500 μm was designed. The beam shaping efficiency we measured by 90%. The final element is fabricated in fused silica. We developed a process which keeps the surface profile and gives the resist the necessary stability for etching. With this process we achieved a high form stability of arbitrary profiles sufficient for the proportional transfer even by ICP-etching (inductive coupled plasma etching). Based on this technology we fabricated the beam shaping elements and lens arrays.
Keywords :
laser beams; optical design techniques; optical elements; optical fabrication; optical pulse shaping; photolithography; refraction; resists; silicon compounds; sputter etching; thermal stability; 1200 micron; 45 micron; 500 micron; Gaussian output beam; ICP-etching; SiO2; beam shaping efficiency; fused silica; geometric optical method; gray tone lithography; inductive coupled plasma etching; lens arrays; refractive beam shaping element fabrication; resist treatment; thin element approximation; Diode lasers; Etching; Foot; Geometrical optics; Laser beams; Optical design; Optical device fabrication; Optical refraction; Plasma stability; Resists;
Conference_Titel :
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN :
0-7803-7734-6
DOI :
10.1109/CLEOE.2003.1313756