DocumentCode :
3182048
Title :
InP self-assembled quantum dots embedded in In0.5Al0.3Ga0.2P grown on GaAs substrates by metalorganic chemical vapor deposition
Author :
Ryou, Jae-Hyun ; Dupuis, Russell D. ; Mathes, David T. ; Hull, Robert ; Reddy, C.V. ; Narayanamurti, Venkatesh ; Kellogg, David A. ; Walter, Gabriel ; Holonyak, Nick, Jr.
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
fYear :
2001
fDate :
2001
Firstpage :
362
Lastpage :
365
Abstract :
We report the characteristics of InP self-assembled quantum dots embedded in In0.5Al0.3Ga0.2P on GaAs substrates. InP quantum dots are grown at 650°C for various deposition times via the Stranski-Krastanow growth mode by metalorganic chemical vapor deposition. Atomic force microscopy and transmission electron microscopy show the formation of densely distributed coherent quantum dots. The InP quantum dots grown for up to “planar-layer-growth equivalent” 15 MLs have dominant sizes of 5-20 nm (height) and a density of ~10 dots/cm2. These InP quantum dots have broad range of luminescence corresponding to red or orange in the visible spectrum, depending on growth times. As the deposition time increases, the photoluminescence peak shifts toward the lower energy side, due to an increase in the dominant size of the quantum dots. Also, optical pumping is performed on double-stacked InP quantum dot layers. In addition, InP/In0.5Al0.3Ga 0.2P/In0.49Al0.51P quantum dot heterostructures exhibit stimulated emission at room temperature and laser operation at ~680 nm
Keywords :
III-V semiconductors; MOCVD; atomic force microscopy; gallium arsenide; indium compounds; optical pumping; photoluminescence; quantum well lasers; self-assembly; semiconductor growth; semiconductor quantum dots; stimulated emission; transmission electron microscopy; 5 to 20 nm; 650 C; 680 nm; GaAs; GaAs substrates; InP self-assembled quantum dots; InP-In0.5Al0.3Ga0.2P-In0.49 Al0.51P; InP/In0.5Al0.3Ga0.2P/In0.49 Al0.51P quantum dot heterostructures; Stranski-Krastanow growth mode; atomic force microscopy; densely distributed coherent quantum dots; deposition time; dominant size; double-stacked InP quantum dot layers; embedding; laser operation; luminescence; metalorganic chemical vapor deposition; optical pumping; photoluminescence peak shift; planar-layer-growth equivalent monolayers; stimulated emission; transmission electron microscopy; visible spectrum; Atomic force microscopy; Atomic layer deposition; Chemical vapor deposition; Gallium arsenide; Indium phosphide; Luminescence; Multilevel systems; Quantum dot lasers; Quantum dots; Transmission electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
Conference_Location :
Nara
ISSN :
1092-8669
Print_ISBN :
0-7803-6700-6
Type :
conf
DOI :
10.1109/ICIPRM.2001.929133
Filename :
929133
Link To Document :
بازگشت