• DocumentCode
    3182048
  • Title

    InP self-assembled quantum dots embedded in In0.5Al0.3Ga0.2P grown on GaAs substrates by metalorganic chemical vapor deposition

  • Author

    Ryou, Jae-Hyun ; Dupuis, Russell D. ; Mathes, David T. ; Hull, Robert ; Reddy, C.V. ; Narayanamurti, Venkatesh ; Kellogg, David A. ; Walter, Gabriel ; Holonyak, Nick, Jr.

  • Author_Institution
    Microelectron. Res. Center, Texas Univ., Austin, TX, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    362
  • Lastpage
    365
  • Abstract
    We report the characteristics of InP self-assembled quantum dots embedded in In0.5Al0.3Ga0.2P on GaAs substrates. InP quantum dots are grown at 650°C for various deposition times via the Stranski-Krastanow growth mode by metalorganic chemical vapor deposition. Atomic force microscopy and transmission electron microscopy show the formation of densely distributed coherent quantum dots. The InP quantum dots grown for up to “planar-layer-growth equivalent” 15 MLs have dominant sizes of 5-20 nm (height) and a density of ~10 dots/cm2. These InP quantum dots have broad range of luminescence corresponding to red or orange in the visible spectrum, depending on growth times. As the deposition time increases, the photoluminescence peak shifts toward the lower energy side, due to an increase in the dominant size of the quantum dots. Also, optical pumping is performed on double-stacked InP quantum dot layers. In addition, InP/In0.5Al0.3Ga 0.2P/In0.49Al0.51P quantum dot heterostructures exhibit stimulated emission at room temperature and laser operation at ~680 nm
  • Keywords
    III-V semiconductors; MOCVD; atomic force microscopy; gallium arsenide; indium compounds; optical pumping; photoluminescence; quantum well lasers; self-assembly; semiconductor growth; semiconductor quantum dots; stimulated emission; transmission electron microscopy; 5 to 20 nm; 650 C; 680 nm; GaAs; GaAs substrates; InP self-assembled quantum dots; InP-In0.5Al0.3Ga0.2P-In0.49 Al0.51P; InP/In0.5Al0.3Ga0.2P/In0.49 Al0.51P quantum dot heterostructures; Stranski-Krastanow growth mode; atomic force microscopy; densely distributed coherent quantum dots; deposition time; dominant size; double-stacked InP quantum dot layers; embedding; laser operation; luminescence; metalorganic chemical vapor deposition; optical pumping; photoluminescence peak shift; planar-layer-growth equivalent monolayers; stimulated emission; transmission electron microscopy; visible spectrum; Atomic force microscopy; Atomic layer deposition; Chemical vapor deposition; Gallium arsenide; Indium phosphide; Luminescence; Multilevel systems; Quantum dot lasers; Quantum dots; Transmission electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
  • Conference_Location
    Nara
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-6700-6
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2001.929133
  • Filename
    929133