Title :
Shear Failure Analysis of Sub-50 μm Flip Chip Lead-free Solder Bumps
Author :
Huang, Mingliang
Author_Institution :
Dalian Univ. of Technol., Dalian
Abstract :
Sn-0.7Cu, Sn-3.5Ag, Sn-4Ag-0.5Cu lead-free solder bumps were produced by stencil printing of solder pastes on wafers having electroless Ni-P immersion Au (ENIG) under bump metallization (UBM). The diameter of the solder bumps was 45˜47 μm. Shear tests were carried out to evaluate the bonding quality of the solder bumps after multiple reflows and thermal aging at 150°C. The fracture surface, cross section microstructure and interfacial intermetallic compounds (IMCs) growth kinetics were investigated to identify the correlation between failure mode and the metallurgical characteristics of the LBM/solder interface IMC layers. The interfacial IMC phase was mainly (CuNi)6Sn5 for Sn-4Ag-0.5Cu and Sn-0.7Cu solders and Ni3Sn4for Sn-3.5Ag solder. The coarsening of Ni3Sri4 IMC phase for Sn-3.5Ag solder was much greater than that of (CuNi)6Sn5 for Sn-0.7Cu and Sn-4Ag-0.5Cu solders with increasing reflow times. Even if only a small amount of Cu is presented at the interface during reaction, the type, size, morphology and evolution of the interfacial IMCs are greatly different.
Keywords :
crystallographic shear; failure analysis; flip-chip devices; solders; wafer bonding; electroless Ni-P immersion; flip chip; interfacial intermetallic compounds; lead-free solder bumps; shear failure analysis; stencil printing; under bump metallization; wafers; Environmentally friendly manufacturing techniques; Failure analysis; Flip chip; Gold; Lead; Metallization; Printing; Testing; Tin; Wafer bonding;
Conference_Titel :
High Density packaging and Microsystem Integration, 2007. HDP '07. International Symposium on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-1252-8
Electronic_ISBN :
1-4244-1253-6
DOI :
10.1109/HDP.2007.4283580