DocumentCode
3182663
Title
1.3 μm quantum-dot lasers with improved high temperature properties
Author
Klopf, F. ; Krebs, R. ; Reithmaier, J.P. ; Forchel, A.
Author_Institution
Technische Phys., Wurzburg Univ., Germany
fYear
2001
fDate
2001
Firstpage
473
Lastpage
476
Abstract
InAs/GaInAs-quantum-dot lasers emitting at 1.3 μm have been grown by solid source molecular beam epitaxy, and the device performance has been studied. Laser structures with 6 dot layers in the active region yield the best results. They show low transparency current densities and high characteristic temperatures. Ridge waveguide lasers with a cavity length of 400 μm and high reflectivity coatings exhibit low threshold currents of 6 mA and high output powers of 18 mW in continuous wave (cw) operation at room temperature. Unmounted devices can be operated in cw mode beyond 80°C. In pulsed mode laser operation above 150°C could be achieved with uncoated 800 μm long devices
Keywords
III-V semiconductors; gallium arsenide; indium compounds; molecular beam epitaxial growth; quantum well lasers; semiconductor growth; semiconductor quantum dots; 1.3 μm quantum-dot lasers; 1.3 mum; 150 C; 18 mW; 400 mum; 6 mA; 80 C; 800 mum; InAs-GaInAs; InAs/GaInAs-quantum-dot lasers; cavity length; device performance; high characteristic temperatures; high temperature properties; low transparency current densities; ridge waveguide lasers; solid source molecular beam epitaxy; Coatings; Current density; Laser modes; Molecular beam epitaxial growth; Power lasers; Quantum dot lasers; Reflectivity; Solid lasers; Temperature; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
Conference_Location
Nara
ISSN
1092-8669
Print_ISBN
0-7803-6700-6
Type
conf
DOI
10.1109/ICIPRM.2001.929179
Filename
929179
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