• DocumentCode
    3182663
  • Title

    1.3 μm quantum-dot lasers with improved high temperature properties

  • Author

    Klopf, F. ; Krebs, R. ; Reithmaier, J.P. ; Forchel, A.

  • Author_Institution
    Technische Phys., Wurzburg Univ., Germany
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    473
  • Lastpage
    476
  • Abstract
    InAs/GaInAs-quantum-dot lasers emitting at 1.3 μm have been grown by solid source molecular beam epitaxy, and the device performance has been studied. Laser structures with 6 dot layers in the active region yield the best results. They show low transparency current densities and high characteristic temperatures. Ridge waveguide lasers with a cavity length of 400 μm and high reflectivity coatings exhibit low threshold currents of 6 mA and high output powers of 18 mW in continuous wave (cw) operation at room temperature. Unmounted devices can be operated in cw mode beyond 80°C. In pulsed mode laser operation above 150°C could be achieved with uncoated 800 μm long devices
  • Keywords
    III-V semiconductors; gallium arsenide; indium compounds; molecular beam epitaxial growth; quantum well lasers; semiconductor growth; semiconductor quantum dots; 1.3 μm quantum-dot lasers; 1.3 mum; 150 C; 18 mW; 400 mum; 6 mA; 80 C; 800 mum; InAs-GaInAs; InAs/GaInAs-quantum-dot lasers; cavity length; device performance; high characteristic temperatures; high temperature properties; low transparency current densities; ridge waveguide lasers; solid source molecular beam epitaxy; Coatings; Current density; Laser modes; Molecular beam epitaxial growth; Power lasers; Quantum dot lasers; Reflectivity; Solid lasers; Temperature; Waveguide lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
  • Conference_Location
    Nara
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-6700-6
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2001.929179
  • Filename
    929179