• DocumentCode
    3182757
  • Title

    Process and integration technologies for InP ICs

  • Author

    Stanchina, W.E. ; Sokolich, M. ; Elliott, K.R.

  • Author_Institution
    HRL Labs LLC, Malibu, CA, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    489
  • Lastpage
    492
  • Abstract
    Indium phosphide HBT technology has evolved over the past fifteen years into a versatile technology to demonstrate a variety of very high frequency integrated circuits. This versatility is achieved from several choices of heterostructure epitaxial materials and a variety of semiconductor processes. This paper summarizes the basic material structures and fabrication processes leading to this versatility along with the basic IC fabrication process and enhancements to it. These choices have enabled organizations world-wide to demonstrate not only the fastest ICs in any technology but also low power operation and ICs applicable to OC-768 fiber optic communications and satellite communications along with the military electronics
  • Keywords
    III-V semiconductors; bipolar integrated circuits; heterojunction bipolar transistors; indium compounds; integrated circuit technology; InP; OC-768 fiber optic communication; heterostructure epitaxial material; high-frequency integrated circuit fabrication; indium phosphide HBT technology; low-power high-speed IC; military electronics; process integration; satellite communication; semiconductor processing; Frequency; Heterojunction bipolar transistors; Indium phosphide; Integrated circuit technology; Military communication; Optical device fabrication; Optical fiber communication; Optical materials; Satellite communication; Semiconductor materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
  • Conference_Location
    Nara
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-6700-6
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2001.929185
  • Filename
    929185