DocumentCode
3182757
Title
Process and integration technologies for InP ICs
Author
Stanchina, W.E. ; Sokolich, M. ; Elliott, K.R.
Author_Institution
HRL Labs LLC, Malibu, CA, USA
fYear
2001
fDate
2001
Firstpage
489
Lastpage
492
Abstract
Indium phosphide HBT technology has evolved over the past fifteen years into a versatile technology to demonstrate a variety of very high frequency integrated circuits. This versatility is achieved from several choices of heterostructure epitaxial materials and a variety of semiconductor processes. This paper summarizes the basic material structures and fabrication processes leading to this versatility along with the basic IC fabrication process and enhancements to it. These choices have enabled organizations world-wide to demonstrate not only the fastest ICs in any technology but also low power operation and ICs applicable to OC-768 fiber optic communications and satellite communications along with the military electronics
Keywords
III-V semiconductors; bipolar integrated circuits; heterojunction bipolar transistors; indium compounds; integrated circuit technology; InP; OC-768 fiber optic communication; heterostructure epitaxial material; high-frequency integrated circuit fabrication; indium phosphide HBT technology; low-power high-speed IC; military electronics; process integration; satellite communication; semiconductor processing; Frequency; Heterojunction bipolar transistors; Indium phosphide; Integrated circuit technology; Military communication; Optical device fabrication; Optical fiber communication; Optical materials; Satellite communication; Semiconductor materials;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
Conference_Location
Nara
ISSN
1092-8669
Print_ISBN
0-7803-6700-6
Type
conf
DOI
10.1109/ICIPRM.2001.929185
Filename
929185
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