Title :
An on wafer probe for measurements at 140 GHz
Author :
Boese, I M ; Collier, R.J. ; Jastrzebski, A.K. ; Ahmed, H. ; Cleaver, J.R. ; Hasko, D.
Author_Institution :
Electron. Labs., Kent Univ., Canterbury, UK
Abstract :
The on wafer probe described here is being designed in collaboration between the Cavendish Laboratory, University of Cambridge and the Electronics Laboratories, University of Kent at Canterbury and is part of a research project on the design of M3ICs at 140 GHz. With the on wafer probe it is possible to contact devices which are situated on a wafer substrate and which are in coplanar waveguide technology (CPW) in order to measure their scattering parameters. The probe is used together with a measurement system using a dielectric waveguide multistate reflectometer which are both mounted on a positioning unit of a probe station
Keywords :
probes; 140 GHz; CPW; EHF; MM-wave measurements; coplanar waveguide technology; dielectric waveguide multistate reflectometer; measurement system; onwafer probe; probe station; scattering parameters measurement; wafer substrate;
Conference_Titel :
Terahertz Technology and Its Applications (Digest No: 1997/151), IEE Colloquium on
Conference_Location :
London
DOI :
10.1049/ic:19970839