Title :
Microwave performances of n.p.n. and p.n.p. AlGaAs/GaAs heterojunction bipolar transistors
Author :
Bayraktaroglu, B. ; Camilleri, N.
Author_Institution :
Texas Instruments Inc., Dallas, TX, USA
Abstract :
The performances of metalorganic vapor-phase-deposition (MOCVD)-grown heterojunction bipolar transistors (HBTs) were compared at microwave frequencies to identify relative merits of each type of device. Figure-of-merit (ft) and maximum frequency of oscillation (f/sub max/) values of devices with 100-nm-thick bases were 22 and 40 GHz for n-p-n transistors, and 19 and 25 GHz for p-n-p transistors, respectively. An accurate device model was developed using the measured S-parameter data. The base resistance of the p-n-p transistors, as determined from the model, was about five times lower than identical-size n-p-n devices. A theoretical comparison of the two types indicates that similar performances may be obtained from both if the base layer thickness of p-n-p transistor is half that of the n-p-n device. Large-signal characterization was carried out at 10 GHz.<>
Keywords :
III-V semiconductors; aluminium compounds; bipolar transistors; equivalent circuits; gallium arsenide; semiconductor device models; solid-state microwave devices; vapour phase epitaxial growth; 10 to 40 GHz; 100 nm; AlGaAs-GaAs; EHF; HBTs; III-V semiconductors; MOCVD; S-parameter data; SHF; base layer thickness; base resistance; device model; heterojunction bipolar transistors; large signal characterisation; metalorganic vapor-phase-deposition; microwave frequencies; self aligned fabrication; Delay effects; Frequency; Gallium arsenide; Heterojunction bipolar transistors; Instruments; MOCVD; Microwave devices; Microwave transistors; Optical noise; Pulse amplifiers;
Conference_Titel :
Microwave Symposium Digest, 1988., IEEE MTT-S International
Conference_Location :
New York, NY, USA
DOI :
10.1109/MWSYM.1988.22090