DocumentCode :
3190554
Title :
Methodology of self-heating free parameter extraction and circuit simulation for SOI CMOS
Author :
Nakayama, Hajime ; Su, Pin ; Hu, Chenming ; Nakamura, Motoaki ; Komatsu, Hiroshi ; Takeshita, Kaneyoshi ; Komatsu, Yasutoshi
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Sony Corp., Atsugi, Japan
fYear :
2001
fDate :
2001
Firstpage :
381
Lastpage :
384
Abstract :
Novel SOI (Silicon On Insulator) model parameter extraction methodology based on the concept of SHE (Self-Heating Effect) free device modeling, is proposed and demonstrated for a 0.18 μm PD (Partially Depleted) SOI technology. In this methodology, prior to SPICE parameter extraction, the device thermal resistances are measured and the current loss due to SHE is added back analytically to DC I-V data. Therefore, the parameters are free from SHE. DC, AC, and transient simulation results using this technology show good agreement with measurement data
Keywords :
CMOS integrated circuits; circuit simulation; integrated circuit modelling; silicon-on-insulator; thermal analysis; thermal resistance; transient analysis; 0.18 micron; DC I-V data; SOI CMOS; SOI model parameter extraction methodology; Si; circuit simulation; current loss; device thermal resistances; partially depleted SOI technology; self-heating effect free device modeling; self-heating free parameter extraction; Circuit simulation; Data mining; Electrical resistance measurement; Logic circuits; Parameter extraction; SPICE; Silicon on insulator technology; Temperature; Thermal conductivity; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Custom Integrated Circuits, 2001, IEEE Conference on.
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-6591-7
Type :
conf
DOI :
10.1109/CICC.2001.929805
Filename :
929805
Link To Document :
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