DocumentCode
3191169
Title
Driving CMOS into the wireless communications arena with technology scaling
Author
Chew, Kok Wai Johnny ; Chu, Shao-Fu Sanford ; Leung, Che Choi Chester
Author_Institution
Chartered Semicond. Manuf. Ltd., Singapore
fYear
2001
fDate
2001
Firstpage
571
Lastpage
574
Abstract
This paper provides a review of the impact of technology scaling on the radio-frequency (RF) performance of CMOS devices. The major active and passive elements are presented. Unity current gain frequency and unity power gain frequency of greater than 50 GHz and 60 GHz respectively have been achieved with the 180 nm transistors. The minimum noise figure is less than 1.5 dB at 2.45 GHz for gate lengths of 250 nm and below. The flicker noise spectra of thin- and thick-gate transistors have risen by an order of magnitude due to the effects of scaling and nitridation. Quality factors (Q) close to 10 and Q-enhancement of greater than 50% at 2.45 GHz have been achieved using 2 μm thick top aluminimum metal on circular stacked coil inductors
Keywords
CMOS integrated circuits; Q-factor; UHF integrated circuits; field effect MMIC; flicker noise; inductors; integrated circuit design; integrated circuit noise; nitridation; 180 nm; 2 micron; 2.45 GHz; 250 nm; CMOS; Q-enhancement; active elements; circular stacked coil inductors; flicker noise; gate lengths; minimum noise figure; nitridation; passive elements; scaling; technology scaling; unity current gain frequency; unity power gain frequency; wireless communications arena; CMOS process; CMOS technology; Capacitance; Communications technology; Integrated circuit technology; MOSFETs; Noise figure; Performance gain; Radio frequency; Wireless communication;
fLanguage
English
Publisher
ieee
Conference_Titel
Custom Integrated Circuits, 2001, IEEE Conference on.
Conference_Location
San Diego, CA
Print_ISBN
0-7803-6591-7
Type
conf
DOI
10.1109/CICC.2001.929844
Filename
929844
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