DocumentCode :
3191518
Title :
Insulator surface flashover with UV and plasma background and external magnetic field
Author :
Hegeler, F. ; Krompholz, H. ; Hatfield, L.L. ; Kristiansen, M.
Author_Institution :
Dept. of Electr. Eng., Texas Tech. Univ., Lubbock, TX, USA
fYear :
1995
fDate :
22-25 Oct 1995
Firstpage :
171
Lastpage :
174
Abstract :
Surface flashover often sets the limit on the maximum voltage of a system in vacuum. UV irradiation and/or plasma will further decrease the flashover potential. This experiment investigates the UV and plasma induced dielectric surface flashover, emphasizes the early phase of breakdown, and uses external magnetic fields to increase the surface flashover potential. In our experimental apparatus, a dc voltage up to 60 kV or a voltage pulse (up to 100 kV with 200 ns duration) is applied to the test gap. The geometry of all interconnecting lines and of the discharge chamber is coaxial and the impedances are closely matched. The current, voltage, and soft X-rays are recorded. The plasma is generated by an electron cyclotron resonance plasma source and the UV radiation originates from a UV enhanced dc Xenon arc lamp. External magnetic fields influence the current in the pre-flashover phase. With a magnetic flux density of only 30 mT, the flashover potential of a UV induced breakdown increases by up to a factor of 4. With a plasma background, the duration of an applied voltage pulse can be increased by a factor of 2 without causing flashover
Keywords :
electric breakdown; flashover; UV irradiation; dielectric breakdown; electron cyclotron resonance plasma; insulator; magnetic field; surface flashover; Dielectric breakdown; Dielectrics and electrical insulation; Flashover; Magnetic fields; Plasma density; Plasma sources; Surface discharges; Testing; Vacuum systems; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1995. Annual Report., Conference on
Conference_Location :
Virginia Beach, VA
Print_ISBN :
0-7803-2931-7
Type :
conf
DOI :
10.1109/CEIDP.1995.483603
Filename :
483603
Link To Document :
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