DocumentCode :
3191559
Title :
Influence of the field emission on the electrical breakdown in vacuum
Author :
Shigeta, T. ; Takahashi, E. ; Ebe, A. ; Ogata, K. ; Hayashi, Y. ; Sone, M. ; Mitsui, H.
Author_Institution :
Musashi Inst. of Technol., Tokyo, Japan
fYear :
1995
fDate :
22-25 Oct 1995
Firstpage :
179
Lastpage :
182
Abstract :
The breakdown voltage of vacuum gaps was measured in order to investigate whether a correlation exists between breakdown voltage and characteristics of field emission, using the advantage of being able to change the field emission characteristics by the Ion beam and Vapor Deposition (IVD) method
Keywords :
electron field emission; vacuum breakdown; IVD method; electrical breakdown; field emission; vacuum gap; Anodes; Cathodes; Chemical vapor deposition; Copper; Crystallization; Electric breakdown; Electron emission; Heating; Predictive models; Vacuum breakdown;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1995. Annual Report., Conference on
Conference_Location :
Virginia Beach, VA
Print_ISBN :
0-7803-2931-7
Type :
conf
DOI :
10.1109/CEIDP.1995.483605
Filename :
483605
Link To Document :
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