DocumentCode :
3193801
Title :
A Design Model for Random Process Variability
Author :
Wang, Victoria ; Agarwal, Kanak ; Nassif, Sani ; Nowka, Kevin ; Markovic, Dejan
Author_Institution :
Univ. of California, Los Angeles
fYear :
2008
fDate :
17-19 March 2008
Firstpage :
734
Lastpage :
737
Abstract :
A new approach to analyze process variation through measured current variation is introduced. The methodology concludes with a simple and convenient posynomial model for random process variability to bridge the gap between existing statistical methods and circuit design. The model contains only design variables: transistor sizes W and L, and operating points Vgs and Vds. Modeling random process variability in this way allows for adaptability to optimization problems, time efficient methods for gathering statistical information in comparison to Monte Carlo, and an alternative equation for hand analysis.
Keywords :
integrated circuit design; integrated circuit modelling; random processes; statistical analysis; Monte Carlo method; current variation; integrated circuit design; posynomial model; random process variability; statistical information; statistical methods; Bridge circuits; Circuit synthesis; Current distribution; Current measurement; Equations; Gaussian distribution; MOSFETs; Metrology; Random processes; Testing; current variation; modeling; principal component analysis; random process variability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design, 2008. ISQED 2008. 9th International Symposium on
Conference_Location :
San Jose, CA
Print_ISBN :
978-0-7695-3117-5
Type :
conf
DOI :
10.1109/ISQED.2008.4479829
Filename :
4479829
Link To Document :
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