DocumentCode
3194164
Title
Observation of heterogeneous, nanoscale deformation on damascene interconnects with a polymeric dielectric
Author
Gross, Todd S. ; Kamsah, N.B. ; Tsukrov, I.
Author_Institution
Dept. of Mech. Eng., New Hampshire Univ., Durham, NH, USA
fYear
2001
fDate
6-6 June 2001
Firstpage
198
Lastpage
200
Abstract
Scanning probe microscopy was used to generate out-of-plane deformation maps around vias in single level Cu-polyimide damascene interconnect structures subjected to a room temperature to 350°C thermal cycle. The deformation maps are obtained by subtracting the before images from the after images. The deformation of the Cu is shown to be highly heterogeneous on the micrometer scale. Evidence on Cu-Ta interfacial sliding, Cu-Cu grain boundary sliding, and diffusion creep is presented.
Keywords
copper; dielectric thin films; diffusion creep; integrated circuit interconnections; polymer films; scanning probe microscopy; slip; 20 to 350 C; Cu; Cu-Cu grain boundary sliding; Cu-Ta interfacial sliding; copper damascene interconnect; diffusion creep; heterogeneous nanoscale deformation; polymeric dielectric; scanning probe microscopy; thermal cycling; via; Copper; Creep; Dielectrics; Grain boundaries; Polyimides; Polymers; Surfaces; Temperature; Thermal expansion; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology Conference, 2001. Proceedings of the IEEE 2001 International
Conference_Location
Burlingame, CA, USA
Print_ISBN
0-7803-6678-6
Type
conf
DOI
10.1109/IITC.2001.930059
Filename
930059
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