DocumentCode
3194281
Title
“New ultrafast high power kW class lasers open next generation applications”
Author
Poprawe, R. ; Gillner, A. ; Hoffmann, D.
fYear
2010
fDate
26-30 Sept. 2010
Firstpage
145
Lastpage
145
Abstract
In this paper we present compact laser sources with a high flexibility in pulse energy (μJ to mJ) and pulse repetition rate (kHz to ~ 100MHz), delivering an average power of more than 400W. Additionally, a broad range of application examples and parameter sets will be presented, from micro- and nanostructuring of various materials to volume processing of dielectrics.
Keywords
dielectric materials; high-speed optical techniques; laser materials processing; nanostructured materials; semiconductor lasers; compact laser sources; dielectrics; microstructuring; nanostructuring; pulse energy; pulse repetition rate; ultrafast high power kW class lasers; volume processing;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Laser Conference (ISLC), 2010 22nd IEEE International
Conference_Location
Kyoto
ISSN
0899-9406
Print_ISBN
978-1-4244-5683-3
Type
conf
DOI
10.1109/ISLC.2010.5642709
Filename
5642709
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