Title :
“New ultrafast high power kW class lasers open next generation applications”
Author :
Poprawe, R. ; Gillner, A. ; Hoffmann, D.
Abstract :
In this paper we present compact laser sources with a high flexibility in pulse energy (μJ to mJ) and pulse repetition rate (kHz to ~ 100MHz), delivering an average power of more than 400W. Additionally, a broad range of application examples and parameter sets will be presented, from micro- and nanostructuring of various materials to volume processing of dielectrics.
Keywords :
dielectric materials; high-speed optical techniques; laser materials processing; nanostructured materials; semiconductor lasers; compact laser sources; dielectrics; microstructuring; nanostructuring; pulse energy; pulse repetition rate; ultrafast high power kW class lasers; volume processing;
Conference_Titel :
Semiconductor Laser Conference (ISLC), 2010 22nd IEEE International
Conference_Location :
Kyoto
Print_ISBN :
978-1-4244-5683-3
DOI :
10.1109/ISLC.2010.5642709
