DocumentCode :
3195617
Title :
First achievement of Deep-UV LED on Si substrate
Author :
Fujikawa, Sachie ; Hirayama, Hideki
Author_Institution :
RIKEN, Wako, Japan
fYear :
2010
fDate :
26-30 Sept. 2010
Firstpage :
21
Lastpage :
22
Abstract :
Deep-ultraviolet (DUV) light-emitting diodes (LEDs) have a wide range of potential applications such as sterilization, water purification, medicine and biochemistry, white light illumination, and so on. DUV-LED fabricating using silicon substrate is attractive as a low-cost DUV light-source, in near future. However, the realization of the LED on the Si substrate which is shorter than 300 nm is not reported till now. Quaternary InAlGaN alloy is attracting attention as candidate material for realizing high-efficiency DUV LEDs due to In incorporation effects. In this study, the authors demonstrated 280 nm-band InAlGaN QW DUV LEDs on Si (111) substrates.
Keywords :
MOCVD coatings; aluminium compounds; gallium compounds; indium compounds; light emitting diodes; silicon; ultraviolet sources; InAlGaN; Si; deep UV LED; deep ultraviolet light emitting diode; metal organic chemical vapor deposition; wavelength 280 nm; Atomic layer deposition; Light emitting diodes; Rough surfaces; Silicon; Substrates; Surface cracks; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Laser Conference (ISLC), 2010 22nd IEEE International
Conference_Location :
Kyoto
ISSN :
0899-9406
Print_ISBN :
978-1-4244-5683-3
Type :
conf
DOI :
10.1109/ISLC.2010.5642771
Filename :
5642771
Link To Document :
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