Title :
MEMS tunable capacitors and switches for RF applications
Author :
Rijks, Th.G.S.M. ; van Beek, J.T.M. ; Steeneken, P.G. ; Ulenaers, M.J.E. ; van Eerd, P. ; Den Toonder, J.M.J. ; van Dijken, A.R. ; De Coster, J. ; Puers, R. ; Weekamp, J.W. ; Scheer, J.M. ; Jourdain, A. ; Tilmans, H.A.C.
Author_Institution :
Philips Res., Eindhoven, Netherlands
Abstract :
RF MEMS capacitive switches and tunable capacitors have been realized in an industrialized thin-film process developed for manufacturing high-quality inductors and capacitors. Combining integrated passives with high-performance tuning and switching elements on the same die offers a potential for building a new generation of RF front-ends for hand-held mobile communication. Capacitive switches with an insertion loss of 0.4 dB and an isolation of 17 dB at 1 GHz have been demonstrated. Dual-gap relay type tunable capacitors have been fabricated that show a continuous and reversible tuning ratio of 12 together with a quality factor larger than 150 at frequencies higher than 0.5 GHz. These are the highest tuning ratio and quality factor reported to date. A 0-level packaging concept that is compatible with the fabrication technology has been adopted.
Keywords :
Q-factor; capacitive sensors; capacitor switching; micromechanical devices; microswitches; mobile handsets; transceivers; 0.4 dB; 1 GHz; MEMS tunable capacitors; RF MEMS capacitive switches; RF applications; RF front-ends; dual-gap relay type tunable capacitors; hand-held mobile communication; high-performance tuning; industrialized thin-film process; switches; switching elements; Capacitors; Communication switching; Manufacturing industries; Micromechanical devices; Q factor; Radio frequency; Radiofrequency microelectromechanical systems; Switches; Thin film inductors; Tuning;
Conference_Titel :
Microelectronics, 2004. 24th International Conference on
Print_ISBN :
0-7803-8166-1
DOI :
10.1109/ICMEL.2004.1314557