DocumentCode
3197157
Title
Atom Probe Tomography Studies of RF Materials
Author
Norem, J. ; Bauer, P. ; Sebastian, J. ; Seidman, D.N.
Author_Institution
ANL, Argonne, IL, 60439 USA, norem@anl.gov
fYear
2005
fDate
16-20 May 2005
Firstpage
612
Lastpage
614
Abstract
We are constructing a facility that combines an atom probe field ion microscope with a multi-element in-situ deposition and surface modification capability. This system is dedicated to rf studies and the initial goal will be to understand the properties of evaporative coatings: field emission, bonding, interdiffusion, etc., to suppress breakdown and dark currents in normal cavities. We also hope to use this system to look more generally at interactions of surface structure and high rf fields. We will present preliminary data on structures relevant to normal and superconducting rf systems.
Keywords
Atomic layer deposition; Bonding; Coatings; Dark current; Electric breakdown; Microscopy; Probes; Radio frequency; Surface structures; Tomography;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 2005. PAC 2005. Proceedings of the
Print_ISBN
0-7803-8859-3
Type
conf
DOI
10.1109/PAC.2005.1590506
Filename
1590506
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