DocumentCode :
3197583
Title :
Thin wafer processing and chip stacking for 3D integration
Author :
Matthias, T. ; Kim, B. ; Wimplinger, M. ; Lindner, P.
Author_Institution :
EV Group, St. Florian am Inn, Austria
fYear :
2010
fDate :
13-16 Sept. 2010
Firstpage :
1
Lastpage :
6
Abstract :
The advantages as well as the technical feasibility of through silicon vias (TSV) and 3D integration have been widely acknowledged by the industry. Today the major focus is on the manufacturability and on the integration of all the different building blocks for TSVs and 3D Interconnects. In this paper the advances in the field of thin wafer processing and wafer bonding are presented with emphasis on the integration of all these process steps.
Keywords :
three-dimensional integrated circuits; wafer bonding; 3D integration; chip stacking; thin wafer processing; through silicon vias; wafer bonding; Annealing; Bonding; Cleaning; Complexity theory; Semiconductor device reliability; Three dimensional displays;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic System-Integration Technology Conference (ESTC), 2010 3rd
Conference_Location :
Berlin
Print_ISBN :
978-1-4244-8553-6
Electronic_ISBN :
978-1-4244-8554-3
Type :
conf
DOI :
10.1109/ESTC.2010.5642873
Filename :
5642873
Link To Document :
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