• DocumentCode
    3197595
  • Title

    Development of Ultra-Fast Silicon Switches for Active X-Band High Power RF Compression Systems

  • Author

    Guo, Jiquan ; Tantawi, Sami G.

  • Author_Institution
    SLAC, Menlo Park, CA 94025, jqguo@slac.stanford.edu
  • fYear
    2005
  • fDate
    16-20 May 2005
  • Firstpage
    701
  • Lastpage
    703
  • Abstract
    In this paper, we present the recent results of our research on the high power ultra-fast silicon RF switches. This switch is composed of a group of PIN diodes on a high purity SOI (silicon on oxide) wafer. The wafer is inserted into a cylindrical waveguide under TE01 mode, performing switching by injecting carriers into the bulk silicon. Our current design use a CMOS compatible process and the device was fabricated at SNF(Stanford Nanofabrication Facility). This design is able to achieve sub-100ns switching time, while the switching speed can be improved further with 3-D device structure and faster circuit. Power handling capacity of the switch is at the level of 10MW. The switch was designed for active X-band RF pulse compression systems - especially for NLC, but it is also possible to be modified for other applications and other frequencies such as L-band.
  • Keywords
    CMOS process; Diodes; Doping; Nanofabrication; Power semiconductor switches; Pulse compression methods; Radio frequency; Silicon on insulator technology; Switching circuits; Waveguide discontinuities;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Particle Accelerator Conference, 2005. PAC 2005. Proceedings of the
  • Print_ISBN
    0-7803-8859-3
  • Type

    conf

  • DOI
    10.1109/PAC.2005.1590533
  • Filename
    1590533