• DocumentCode
    3198099
  • Title

    On the microscopic limit of the reaction-diffusion model for the negative bias temperature instability

  • Author

    Schanovsky, Franz ; Grasser, Tibor

  • Author_Institution
    Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
  • fYear
    2011
  • fDate
    16-20 Oct. 2011
  • Firstpage
    17
  • Lastpage
    21
  • Abstract
    It has recently been proposed that the inability of the reaction-diffusion model for the negative bias temperature instability to properly predict the experimentally observed recovery transients is due to the incomplete description of atomic motion in the one dimensional macroscopic formulation of the theory. In order to investigate this claim, we develop a microscopic formulation of the reaction-diffusion model and simulate it using the kinetic Monte Carlo algorithm. The results of the macroscopic and the atomistic formulation are compared. It shows that the recovery behavior predicted by the RD theory is not affected by the change of the formulation. However, differences arise for the degradation behavior, which, as the microscopic formulation is assumed to be the physically more accurate description, raise questions regarding the physical relevance of the reaction-diffusion theory.
  • Keywords
    Monte Carlo methods; reaction-diffusion systems; Monte Carlo algorithm; atomic motion; degradation behavior; microscopic limit; negative bias temperature instability; reaction-diffusion model; Boundary conditions; Degradation; Mathematical model; Microscopy; Negative bias temperature instability; Stochastic processes; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report (IRW), 2011 IEEE International
  • Conference_Location
    South Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4577-0113-9
  • Type

    conf

  • DOI
    10.1109/IIRW.2011.6142578
  • Filename
    6142578