DocumentCode :
3198685
Title :
Experimental characterization of the interactions between HCI, off-state and BTI degradation modes
Author :
Federspiel, X. ; Cacho, F. ; Roy, D.
Author_Institution :
STMicroelectron., Crolles, France
fYear :
2011
fDate :
16-20 Oct. 2011
Firstpage :
133
Lastpage :
136
Abstract :
In this paper we will review experiments combining several types of FET device degradation modes, including HCI, off-state and BTI and analyze the potential interaction between degradation modes. We will compare experimental results to theoretical models, predicting degradation of devices in general AC stress or various mission profiles, covering a wide range of Vd/Vg polarization. The interaction effect will also be discussed to analyze the nature and localization of defects.
Keywords :
field effect transistors; AC stress; BTI degradation modes; FET device degradation modes; HCI; Degradation; Equations; Human computer interaction; Mathematical model; Stress; Stress measurement; Time measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report (IRW), 2011 IEEE International
Conference_Location :
South Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
978-1-4577-0113-9
Type :
conf
DOI :
10.1109/IIRW.2011.6142608
Filename :
6142608
Link To Document :
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