• DocumentCode
    3199602
  • Title

    Benefits of pure palladium for ENEP and ENEPIG surface finishes

  • Author

    Oezkoek, Mustafa ; Ramos, Gustavo ; Metzger, Dieter ; Roberts, Hugh

  • Author_Institution
    Atotech Deutschland GmbH, Berlin, Germany
  • fYear
    2010
  • fDate
    13-16 Sept. 2010
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    This paper compares the properties of pure palladium versus palladium-phosphorus deposits in surface finishes ENEP (electroless nickel/electroless palladium process) and ENEPIG (electroless nickel/electroless palladium/immersion gold). ENEPIG pand ENEP has recieved increase attention for both packaging/integrated circuit-substrate and PWD applications. The investigation is in terms of hardness between the two types of palladium layers, internal stress, solder spread, surface topography, gold wire bonding process window and copper wire bonding capability. Results show that using electroless pure Pd deposition can enhance the performance of ENEPIG and ENEP surface finishes. In addition to offering the reduction to cost by allowing the reduction in gold thickness, the ENEP surface enables next generation interconnection techniques.
  • Keywords
    copper; electroless deposition; electronics packaging; gold; hardness; internal stresses; lead bonding; nickel; palladium; palladium alloys; phosphorus alloys; solders; surface finishing; surface topography; Cu; Ni-Pd; Ni-Pd-Au; Ni-PdP; Ni-PdP-Au; copper wire bonding capability; electroless nickel/electroless palladium process; electroless nickel/electroless palladium/immersion gold; gold wire bonding process window; hardness; integrated circuit-substrate; interconnection; internal stress; packaging; solder spread; surface finishes; surface topography; Companies; Nickel; Rough surfaces; Stress; Surface roughness; Surface topography; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic System-Integration Technology Conference (ESTC), 2010 3rd
  • Conference_Location
    Berlin
  • Print_ISBN
    978-1-4244-8553-6
  • Electronic_ISBN
    978-1-4244-8554-3
  • Type

    conf

  • DOI
    10.1109/ESTC.2010.5642965
  • Filename
    5642965