Title :
Polymer Ultra-violet Light Filter for MEMS Fabrication
Author :
Korivi, N.S. ; Yellampalli, S. ; Jiang, L.
Author_Institution :
Louisiana State Univ. Baton Rouge, Baton Rouge
Abstract :
The development of micro-electromechanical systems (MEMS) is based on the fabrication of microscale structures and features in a photo-sensitive polymer or photoresist, by selectively exposing it to ultra-violet (UV) light. The standard UV sources used in MEMS fabrication have broadband UV light output in the range of 305 nm to 436 nm. The use of such sources causes problems in some situations due to unequal absorption of different components of UV light in photoresist material, causing improper UV dose distribution in the different regions of the photoresist. This paper reports the development of a novel polymer filter that can attenuate the different UV wavelength components, allowing for a more uniform UV dose to be delivered to all regions of the photoresist.
Keywords :
micromechanical devices; optical filters; photoresists; polymers; MEMS fabrication; microelectromechanical systems; microscale structures; photoresist; photosensitive polymer; polymer ultraviolet light filter; Electromagnetic wave absorption; Fabrication; Microelectromechanical devices; Microelectromechanical systems; Micromechanical devices; Optical filters; Optical materials; Optical surface waves; Polymers; Resists; High Aspect Ratio Microstructures; MEMS Fabrication; Photolithography; UV Filter;
Conference_Titel :
System Theory, 2008. SSST 2008. 40th Southeastern Symposium on
Conference_Location :
New Orleans, LA
Print_ISBN :
978-1-4244-1806-0
Electronic_ISBN :
0094-2898
DOI :
10.1109/SSST.2008.4480244
