A high-order terminal iterative learning control scheme [RTP-CVD application]

Author

Chen, YangQuan ; Xu, Jian-Xin ; Wen, Changyun

Author_Institution

Dept. of Electr. Eng., Nat. Univ. of Singapore, Singapore

Volume

4

fYear

1997

fDate

10-12 Dec 1997

Firstpage

3771

Abstract

A high-order terminal iterative learning control (ILC) scheme is proposed where only the terminal output tracking error instead of the entire output trajectory tracking error is used to update the control profile. A convergence condition is obtained for a class of uncertain discrete-time time-varying linear systems. An application example is presented, by simulation, for a rapid thermal processing chemical vapor deposition (RT-PCVD) thickness control problem in the wafer fab industry

Keywords

chemical vapour deposition; convergence; discrete time systems; learning systems; process control; rapid thermal processing; semiconductor process modelling; thickness control; time-varying systems; uncertain systems; convergence condition; high-order terminal iterative learning control; rapid thermal processing chemical vapor deposition; terminal output tracking error; thickness control; uncertain discrete-time time-varying linear systems; wafer fab industry; Chemical industry; Chemical vapor deposition; Convergence; Electrical equipment industry; Error correction; Linear systems; Rapid thermal processing; Thickness control; Time varying systems; Trajectory;

fLanguage

English

Publisher

ieee

Conference_Titel

Decision and Control, 1997., Proceedings of the 36th IEEE Conference on

Conference_Location

San Diego, CA

ISSN

0191-2216

Print_ISBN

0-7803-4187-2

Type

conf

DOI

10.1109/CDC.1997.652444

Filename

652444