Title :
CIS solar cells with ZnO buffer layers
Author :
Olsen, Larry C. ; Aguilar, Heriberto ; Addis, F. William ; Lei, Wenhua ; Li, Jun
Author_Institution :
Washington State Univ., Richland, WA, USA
Abstract :
This paper describes investigations of CIS solar cells with ZnO buffer layers. Studies concentrate on determining optimum ZnO buffer layer properties that will yield the maximum ZnO/CIS solar cell efficiency. Buffer layers are grown by chemical vapor deposition (CVD) by reacting a zinc adduct with tetrahydrofuran to grow ZnO. Substrate temperatures (Tsub) have been varied from 100°C to 350°C, with the best device performance obtained for Tsub≈225°C to 250°C. ZnO/CIS solar cells were fabricated by first depositing a ZnO buffer layer, followed by deposition of a low resistivity ZnO top contact layer and a Al/Ag collector grid. Several cells have been fabricated with an area of 0.44 cm2 that have total area efficiencies greater than 11%. In particular, a cell was fabricated with a Siemens substrate that exhibited a total area efficiency of 11.3%, and one based on a NREL substrate that has a total area efficiency of 12%. This work has focused on determining optimum deposition parameters for CVD ZnO buffer layers. It is clear that in order to achieve efficient ZnO/CIS cells, the buffer layer must be deposited with a high resistivity
Keywords :
CVD coatings; II-VI semiconductors; chemical vapour deposition; copper compounds; indium compounds; semiconductor device testing; semiconductor thin films; solar cells; ternary semiconductors; zinc compounds; 100 to 350 C; 11.3 percent; 12 percent; 225 to 250 C; NREL substrate; Siemens substrate; ZnO-CuInSe2; ZnO/CuInSe2 solar cells; buffer layers; chemical vapor deposition; deposition parameters; fabrication; resistivity; semiconductor; solar cell efficiency; Buffer layers; Chemical vapor deposition; Computational Intelligence Society; Conductivity; Fabrication; Photovoltaic cells; Substrates; Temperature; Testing; Zinc oxide;
Conference_Titel :
Photovoltaic Specialists Conference, 1996., Conference Record of the Twenty Fifth IEEE
Conference_Location :
Washington, DC
Print_ISBN :
0-7803-3166-4
DOI :
10.1109/PVSC.1996.564299